A Plasma Matching Technique for Wideband Electrically Small Antennas

Project ID: TECH-2024-29

Background

The demand for wideband electrically small antennas (ESAs) is rapidly growing because of (1) the need for compact multi-functional devices and (2) the limited space available in many applications, especially over low radio-frequency range. However, ESAs are narrowband, non-efficient, and very difficult to be matched, especially over a wide frequency band. Suboptimal small antennas are today’s primary options, and difficult compromises are often made. These previous restrictions can be lifted by using plasma’s inherent negative permittivity. By utilizing this negative capacitance wideband ESA impedance matching is achieved.

Invention Description

Researchers at the University of Toledo have developed an ultrawideband plasma matching technique for electrically small antennas, surpassing the Chu-Harrington Limit by a factor of > 3.

Applications

Long-range communications, Underwater communications, UAV navigation systems, Mobile networks, Mitigating communication blackout in hypersonic vehicles, IoT Devices

Advantages

• Utilizing plasma matching, it is possible to realize ultrawideband electrically small antennas with enhanced performance beyond the fundamental Chu limit
• Has bandwidth > 100% and ka < 0.1 
• The technique is scalable and extendable to various frequency bands and antenna configurations
• Plasma matching technique can handle high powers and harsh environmental conditions
• In transmitting scenarios, it is possible to use part of the transmitting signal for plasma generation to make it self-sustained

IP Status: Patent Pending